| 2 | 1/1 | 返回列表 |
| 查看: 592 | 回復(fù): 1 | |||
[交流]
【資源】等離子光譜資源之四——Lecture Notes on Principles of Plasma Processing 已有1人參與
|
|
Lecture Notes on Principles of Plasma Processing By Francis F. Chen, Jane P. Chang Publisher: Springer Number Of Pages: 208 Publication Date: 2003-01-31 ISBN-10 / ASIN: 0306474972 ISBN-13 / EAN: 9780306474972 Product Description: Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. The included CD contains a copy of the book which can be indexed using a Search function, and which can be enlarged on a monitor for a closer look at the diagrams. Sample homework and exam problems can also be found on the CD. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry. Summary: Good for quick reading, Need Lieberman's book Rating: 3 I found this to be a good book for quick reading. However, you need Lieberman and Lichtenberg (L &L) for a detailed treatment. L & L is of course not a very pleasant reading, so this provides a good break to "keep moving" through the material. 網(wǎng)盤下載鏈接:----推薦。! http://d.namipan.com/d/b3ecf97b7 ... 5e1b71e9e2b86da6b00 鏡像下載鏈接: http://ifile.it/du21be/chen_f.f. ... e_coursetc248s.djvu |

木蟲 (正式寫手)
| 2 | 1/1 | 返回列表 |
| 最具人氣熱帖推薦 [查看全部] | 作者 | 回/看 | 最后發(fā)表 | |
|---|---|---|---|---|
|
[考研] 336求調(diào)劑 +6 | kiyy 2026-04-01 | 6/300 |
|
|---|---|---|---|---|
|
[考研] 求調(diào)劑求調(diào)劑 +6 | 121. 2026-04-02 | 6/300 |
|
|
[考研] 288求調(diào)劑 一志愿哈工大 材料與化工 +30 | 洛神哥哥 2026-03-31 | 32/1600 |
|
|
[考研] 275求調(diào)劑 +13 | jjjjjjjjjjl 2026-03-27 | 13/650 |
|
|
[考研] 272求調(diào)劑,接受跨專業(yè)調(diào)劑! +4 | 閑魚盧 2026-03-31 | 4/200 |
|
|
[考研] 材料考研調(diào)劑 +9 | Gs大王 2026-04-02 | 9/450 |
|
|
[考研] 材料調(diào)劑 +11 | 一樣YWY 2026-03-31 | 11/550 |
|
|
[考研] 材料專碩調(diào)劑 +17 | 椰椰。 2026-03-29 | 17/850 |
|
|
[考研] 320分,材料與化工專業(yè),求調(diào)劑 +14 | 一定上岸aaa 2026-03-27 | 18/900 |
|
|
[考研] 285求調(diào)劑 +7 | AZMK 2026-03-30 | 13/650 |
|
|
[考研] 材料0856 英一數(shù)二 323 求調(diào)劑 +9 | 袁sy 2026-04-01 | 9/450 |
|
|
[考研] 333求調(diào)劑 +4 | 阿科逸 2026-03-31 | 4/200 |
|
|
[考研] 080200學(xué)碩,機(jī)械工程專業(yè)277分,求帶走! +4 | 瓶子PZ 2026-03-31 | 4/200 |
|
|
[考研] 材料科學(xué)與工程求調(diào)劑 +13 | 深V宿舍吧 2026-03-29 | 13/650 |
|
|
[考研] 合肥區(qū)域性重點(diǎn)一本招收調(diào)劑 +4 | 6266jl 2026-03-30 | 8/400 |
|
|
[考研] 0703化學(xué) +20 | 妮妮ninicgb 2026-03-27 | 20/1000 |
|
|
[考博] 材料專業(yè)申博 +5 | 杜雨婷dyt 2026-03-29 | 5/250 |
|
|
[考研] 材料專碩 085600求調(diào)劑 +7 | BBQ233 2026-03-30 | 7/350 |
|
|
[考研] 305求調(diào)劑 +8 | RuiFairyrui 2026-03-28 | 8/400 |
|
|
[考研] 求調(diào)劑 +7 | 爭取九點(diǎn)睡 2026-03-28 | 8/400 |
|