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tigger8376木蟲 (著名寫手)
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[交流]
【求助】KH570的應(yīng)用 已有5人參與
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最近看到一篇用KH570改性納米SiO2的文章,其中對KH570的使用工藝有如下描述: Thirty grams of nano-SiO2 particles and 500 g ethanol were added to a high-speed dispersion machine filled with zirconium oxide beads and ground for 1–2 h at 4000 rpm. The mixture was filtrated to remove the zirconium oxide beads. Then 4.5 g KH570, which was pre-hydrolysed for 2 h in pH 4.00 ethanol/water (1/9, wt) solution adjusted by acetic acid, was slowly dripped in, then triethylamine was added until the pH reached 9. After 2 h reaction the mixture was filtrated to remove the solvent and then were dried at 120 C for 4 h to further remove the rudimental solvent. 本人對這部分的工藝有如下不解之處: 1. 為什么后期要用三乙胺調(diào)PH=9?作用是什么 2. KH570在本文中的用量是否太大了? 3.處理后的SiO2過濾就可以了嗎,難道不要用KH570的溶劑洗滌? PS:文獻來自于 European Polymer Journal 42 (2006) 1643–1652 title: Effects of surface modification of fumed silica on interfacial structures and mechanical properties of poly(vinyl chloride) composites [ Last edited by tigger8376 on 2010-5-17 at 00:42 ] |
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