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jiayou201101金蟲(chóng) (著名寫(xiě)手)
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[求助]
請(qǐng)幫忙翻譯一句話(huà),謝謝。。
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請(qǐng)幫忙把下面一句話(huà)翻譯成英文,謝謝!。ㄏ嚓P(guān)術(shù)語(yǔ)已放在下面): 值得一提的是,在Hf的濃度達(dá)到8mol%時(shí),抗光散射能力均有一定程度的減弱,對(duì)這個(gè)現(xiàn)象,我們認(rèn)為,在晶體中高摻雜Hf4+時(shí),會(huì)有過(guò)多的Hf4+開(kāi)始占據(jù)正常的Li位,晶體內(nèi)部出現(xiàn)新的缺陷鋰空位( ),由于鋰空位( )的增加,導(dǎo)致晶體的抗光散射能力減弱。 (專(zhuān)業(yè)術(shù)語(yǔ)的翻譯附上: 晶體:crystals,抗光散射能力:resistance to light-induced scattering,缺陷:defect,濃度:concentration ,鋰空位缺陷:Li vacancy defects) |
金蟲(chóng) (小有名氣)
我的翻譯如下,應(yīng)該對(duì)你有所幫助.![]() It is to note that there is a certain degree of weakening of all the resistance to light-induced scattering with the concentration of 8mol% of Hf. This phenomenon make us think that there will be too much Hf4+ begin to take normal the Li position in the crystals with highly doped Hf4+. In addition, novel Li vacancy defects () can be found within the crystals, and as the number of the Li vacancy defects increases, the resistance to light-induced scattering of the crystals decreased accordingly. |
| It is noticed that there is a certain degree of weakening of the resistance to light-induced scattering when the concentration of Hf reaches 8 mol% . This phenomenon may due to the over supplied Hf4+ begin to take the normal Li position in the crystals with highly dosed Hf4+ and form novel Li vacancy defects () within the crystals. As the number of the Li vacancy defects increases, the resistance to light-induced scattering of the crystals decreased accordingly. |

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