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jaychenyl木蟲 (小有名氣)
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[交流]
離子探針(IMS 1280或NanoSIMS)用Cs+做一次離子源時的電子槍補償 已有2人參與
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離子探針用Cs+做一次離子源時的需要電子槍補償,是什么原因? 為何O-做一次離子源時不需要呢? |
鐵蟲 (知名作家)
木蟲 (小有名氣)
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我看到有篇文獻提了一下,跟你說的一樣。我也貼過來了,不過最后一句我沒明白,This can be problematic when parts of the sample conduct.為什么部分導(dǎo)電就會有問題?另外,用O-就不會有電荷累積嗎? As SIMS uses high voltages to accelerate the primary ions, the sample must be conductive. It is therefore necessary to coat non-conducting samples, such as minerals, glasses and ceramics, with a conductive metal film. Typically, a thin (5 nm) gold (Au) coat is used as Au generally does not react with the sample. During sputtering, the Au coat is eroded away exposing the underlying sample surface, which becomes, once again, non-conductive. The ionisation efficiency, and hence the secondary ion yield from the sample, increases with increasing primary ion implantation. As the ion beam erodes the Au coat away, there is an optimum time when the signal is strongest – shortly before the Au coat is entirely removed. After this stage, an electron flood gun may be used to dissipate charge build-up along the edges of the sputter crater, and allow secondary ions to leave the sample surface. This can be problematic when parts of the sample conduct. |
鐵蟲 (知名作家)
木蟲 (小有名氣)
銅蟲 (小有名氣)

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