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[求助]
求助查找2篇SCI論文的檢索號
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1.發(fā)表在PHYSICS OF PLASMAS 19, 033510 (2012)上面的一篇文章，Zhi Li, Zhen Zhao, and Xuehui Li. doi: 10.1063/1.3691894，題目是：Numerical model of an Ar/NH3 atmospheric pressure direct current discharge in parallel plate geometry。麻煩幫忙查一下檢索號，感激不盡！ 2.發(fā)表在JOURNAL OF APPLIED PHYSICS 111, 113304 (2012)上面的一篇文章，Zhi Li, Zhen Zhao, and Xuehui Li. doi: 10.1063/1.4728210，題目是：Numerical analysis of a mixture of Ar/NH3 microwave plasma chemical vapor deposition reactor。麻煩幫忙查一下檢索號，感激不盡！ |
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416726641
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chongjibo888
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【答案】應(yīng)助回帖
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感謝參與，應(yīng)助指數(shù) +1
lizhi8172: 金幣+50, ★★★★★最佳答案, 謝謝 2012-12-09 10:07:32
感謝參與，應(yīng)助指數(shù) +1
lizhi8172: 金幣+50, ★★★★★最佳答案, 謝謝 2012-12-09 10:07:32
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Numerical model of an Ar/NH3 atmospheric pressure direct current discharge in parallel plate geometry 作者: Li, Z (Li, Zhi)1,2; Zhao, Z (Zhao, Zhen)3,4; Li, XH (Li, Xuehui)1,5 來源出版物: PHYSICS OF PLASMAS 卷: 19 期: 3 文獻(xiàn)號: 033510 DOI: 10.1063/1.3691894 出版年: MAR 2012 被引頻次: 1 (來自 Web of Science) 引用的參考文獻(xiàn): 62 [ 查看 Related Records ] 引證關(guān)系圖 摘要: A one dimensional fluid model is used to investigate the role of ammonia added to an argon DC discharge at atmospheric pressure. The equations solved are the particle balances, assuming a drift-diffusion approximation for the fluxes, and the electron energy balance equation. The self-consistent electric field is obtained from the simultaneous solution of Poisson's equation. The electron-neutral collision rates are expressed as a function of the average electron energy. The model is comprised of 40 species (neutrals, radicals, ions, and electrons). In total, 75 electron-neutral, 43 electron-ion, 167 neutral-neutral, 129 ion-neutral, 28 ion-ion, and 90 3-body reactions are used in the model. The effects of gas mixing ratio on the densities of plasma species are systematically investigated. The calculated densities of the main plasma species are presented. It is found that in an Ar/NH3 plasma, the main neutrals (Ar*, Ar**, NH3*, NH, H-2, NH2, H, and N-2) are present at high densities. The Ar-2(+) and Ar+ ions are the dominant ions in the plasma. Furthermore, the NH3+ ions have a relatively higher density than other ammonia ions, whereas the density of other ions is negligible. Finally, a comparison is made between a pure Ar discharge and dielectric barrier discharge in a mixture of Ar/NH3. It is demonstrated that gas mixing ratio has a significant effect on the densities of plasma species, besides ammonia radical molecules and ammonia ions, and it also affects their ratio. Once the mixing ratio of Ar/NH3 is close to 1: 1 at atmospheric pressure, the densities of NH, NH2+ and NH4+ reach to the maximum. The maximum of the different positive ammonia ions corresponds to the different ammonia mixing ratio. (C) 2012 American Institute of Physics. [http://dx.doi.org/10.1063/1.3691894] 入藏號: WOS:000302226500086 文獻(xiàn)類型: Article 語種: English KeyWords Plus: CROSS-SECTIONS; NITROGEN; PLASMAS; GENERATION; AMMONIA; SURFACE 通訊作者地址: Li, Z (通訊作者),Dalian Univ Technol, Sch Phys & Optoelect Engn, Dalian 116024, Peoples R China. 地址: 1. Dalian Univ Technol, Sch Phys & Optoelect Engn, Dalian 116024, Peoples R China 2. Univ Sci & Technol Liaoning, Sch Sci, Anshan 114051, Peoples R China 3. Anshan Normal Univ, Dept Chem, Anshan 114007, Peoples R China 4. Univ Sci & Technol Liaoning, Sch Chem Engn, Anshan 114051, Peoples R China 5. Dalian Univ, Phys Sci & Tech Coll, Dalian 116622, Peoples R China 電子郵件地址: lizhi81723700@163.com 基金資助致謝: 基金資助機(jī)構(gòu) 授權(quán)號 National Science Foundation, People's Republic of China 51077006 [顯示基金資助信息][隱藏基金資助信息] This work was partly supported by Grant No. 51077006 from the National Science Foundation, People's Republic of China. Finally, we wish to thank Professor Mark J. Kushner (Electrical Engineering and Computer Science Department, University of Michigan, Ann Arbor) for the useful information about the cross sections of NH 出版商: AMER INST PHYSICS, CIRCULATION & FULFILLMENT DIV, 2 HUNTINGTON QUADRANGLE, STE 1 N O 1, MELVILLE, NY 11747-4501 USA Web of Science 類別: Physics, Fluids & Plasmas 研究方向: Physics IDS 號: 918CJ ISSN: 1070-664X |
3樓2012-12-06 10:01:23
chongjibo888
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【答案】應(yīng)助回帖
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Numerical analysis of a mixture of Ar/NH3 microwave plasma chemical vapor deposition reactor 作者: Li, Z (Li, Zhi)1,2; Zhao, Z (Zhao, Zhen)3,4; Li, XH (Li, Xuehui)1,5 來源出版物: JOURNAL OF APPLIED PHYSICS 卷: 111 期: 11 文獻(xiàn)號: 113304 DOI: 10.1063/1.4728210 出版年: JUN 1 2012 被引頻次: 0 (來自 Web of Science) 引用的參考文獻(xiàn): 20 [ 查看 Related Records ] 引證關(guān)系圖 摘要: A two-dimensional fluid model has been used to investigate the properties of plasma in Ar/NH3 microwave electron cyclotron resonance discharge at low pressure. The electromagnetic field model solved by the three-dimensional Simpson method is coupled to a fluid plasma model. The finite difference method was employed to discrete the governing equations. 40 species (neutrals, radicals, ions, and electrons) are consisted in the model. In total, 75 electron-neutral, 43 electronion, 167 neutral-neutral, 129 ion-neutral, 28 ion-ion, and 90 3-body reactions are used in the model. According to the simulation, the distribution of the densities of the considered plasma species has been showed and the mechanisms of their variations have been discussed. It is found that the main neutrals (Ar*, Ar**, NH3*, NH, H-2, NH2, H, and N-2) are present at high densities in Ar/NH3 microwave electron cyclotron resonance discharge when the mixing ratio of Ar/NH3 is 1:1 at 20 Pa. The density of NH is more than that of NH2 atom. And NH3+ are the most important ammonia ions. But the uniformity of the space distribution of NH3+ is lower than the other ammonia ions. (C) 2012 American Institute of Physics. [http://dx.doi. org/10.1063/1.4728210] 入藏號: WOS:000305401400048 文獻(xiàn)類型: Article 語種: English KeyWords Plus: DISCHARGE; NITROGEN; MODEL 通訊作者地址: Li, Z (通訊作者),Dalian Univ Technol, Sch Phys & Optoelect Engn, Dalian 116024, Peoples R China. 地址: 1. Dalian Univ Technol, Sch Phys & Optoelect Engn, Dalian 116024, Peoples R China 2. Univ Sci & Technol Liaoning, Sch Sci, Anshan 114051, Peoples R China 3. Anshan Normal Univ, Dept Chem, Anshan 114007, Peoples R China 4. Univ Sci & Technol Liaoning, Sch Chem Engn, Anshan 114051, Peoples R China 5. Dalian Univ Technol, Phys Sci & Tech Coll, Dalian 116622, Peoples R China 電子郵件地址: lxh49dlu@163.com 出版商: AMER INST PHYSICS, CIRCULATION & FULFILLMENT DIV, 2 HUNTINGTON QUADRANGLE, STE 1 N O 1, MELVILLE, NY 11747-4501 USA Web of Science 類別: Physics, Applied 研究方向: Physics IDS 號: 960PW ISSN: 0021-8979 |
4樓2012-12-06 10:01:55
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5樓2012-12-06 10:02:16
416726641
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lizhi81726樓2012-12-06 10:03:27
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7樓2012-12-06 10:07:03
tastefulboy
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8樓2012-12-06 10:58:13
nuaawq
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【答案】應(yīng)助回帖
感謝參與，應(yīng)助指數(shù) +1
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Physics of Plasmas / Volume 19 / Issue 3 / ARTICLES / Low-Temperature Plasmas, Plasma Applications, Plasma Sources, Sheaths Previous Article | Next Article FULL-TEXT OPTIONS: Read Online (HTML)Download PDF Permissions / Reprints Phys. Plasmas 19, 033510 (2012); http://dx.doi.org/10.1063/1.3691894 (10 pages) This paper appears in: Journal of Applied Physics Date of Publication: Jun 2012 Author(s): Li, Zhi School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024, People’s Republic of China Zhao, Zhen ; Li, Xuehui Volume: 111 , Issue: 11 Page(s): 113304 - 113304-5 Product Type: Journals & Magazines |
» 本帖已獲得的紅花（最新10朵）
9樓2012-12-06 16:24:16
chongjibo888
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10樓2012-12-09 09:05:30
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