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After evacuating the reaction system and re-running the experiment, almost identical gas production rates were achieved in the second as well as third runs. More than 7,200 p,mol gases evolved(H2, about 4,800 μmol; and O2, about 2,400μmol) during the course of a 400-h experiment. The catalyst samples remained unchanged during the course of reaction, suggesting that thephotocatalytic activity is stable under visible Light irradiation. The turnover number-the ratio of total amount of gas evolved to catalyst (1,412 μmol in our system)一exceeded 5 after 400 h reaction time. The turnover number in terms of reacted electrons relative to the amount of Ni loaded on the surface of the sample and Ni doped in InTaO4 reached 39 at 400h reaction time,indicating that the reaction occurs catalytically. Wavelength dependence of the photocatalytic gas evolution on the photocatalyst was investigated using different cut-off filters. As a comparison, the Pt/TiO2 photocatalyst (P-25) was measured using the same method. Although photocatalytic activity was observed when using Inl-xNixTaO4 and a cut-off filter of λ>500 nm, it is much lower than that observed under λ>420 nm light irradiation.The rates of H2 and O2 evolution were 1.91 and 0.86 μmolh-1 on In0.9Ni0.1TaO4 respectively, under λ>500 nm Light irradiation. The activity disappeared when the wavelength of light irradiation was larger than 550 nm. The results are in good agreement with the observation of diffuse reflectance spectra (see Fig. 3). By contrast, no photocatalytic activity was obtained on Pt/TiO2 under visible light irradiation (λ>420 nm). X-ray diffraction analysis showed that there is no observable structural difference between the samples before and after reaction. Full-profile structure refinement of XRD data was performed using the Rietveld program REITf1N12, showing that all samples crystallize in the same wolframite structure, monoclinic with space group P2/a, and that the lattice parameters decrease along all three axes as the Ni content χ is increased, as long as χ<0.15. Figure 4 shows the change of V/Z with doping content, where V and Z are cell volume and the number of formulas per cell, respectively. The inset shows the c-axis parameter as a function of Ni content, to illustrate the lattice parameter changes induced by doping. There is a linear decrease of V/Z with increasing Ni content as long as χ<0.15, while V/Z has a small expansion when the Ni content χ>0.15. In compounds with a Ni-doping content greater than 0.2, an impurity phase, NiTa2O6, appears and increases its volume fraction significandy with increasing Ni content. It is known13 that the structural stability of oxides consisting of octahedra such as ABO3, can be estimated by calculating the tolerance factor defined as t=(rA+r0)/ (rB+r0)，where rA, rB and r0 are the radii of the respective ions. 0.79 |
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zhaosenkuaku
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落步生花: 金幣+15, 翻譯EPI+1, ★★★很有幫助, 謝謝 2013-01-29 10:15:35
落步生花: 金幣+15, 翻譯EPI+1, ★★★很有幫助, 謝謝 2013-01-29 10:15:35
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將反應(yīng)體系抽真空并重新運(yùn)行實(shí)驗(yàn)后，幾乎相同的產(chǎn)氣率，實(shí)現(xiàn)了在 第二以及第三的運(yùn)行。超過(guò)7,200 P，摩爾釋出氣體（H2，約4800微摩爾和O2，約2400微摩爾）的400-H實(shí)驗(yàn)過(guò)程中。催化劑樣品在反應(yīng)過(guò)程中保持不變，這表明thephotocatalytic活性可見(jiàn)的光照射下是穩(wěn)定的。的營(yíng)業(yè)額有多少的氣體總量的比例演變?yōu)榇呋瘎?,412微摩爾在我們的系統(tǒng)中），一超過(guò)5 400小時(shí)后的反應(yīng)時(shí)間。在400h的反應(yīng)時(shí)間的營(yíng)業(yè)額的Ni的量的表面上的樣品和Ni中摻雜InTaO4加載相對(duì)于反應(yīng)的電子數(shù)達(dá)到39，表明發(fā)生反應(yīng)催化。 上的光催化劑的光催化氣體逸出的波長(zhǎng)依賴(lài)性的研究了使用不同截止濾光片。 Pt/TiO2光催化劑（P-25）作為比較，使用相同的方法測(cè)定。雖然光催化活性得到使用INL-xNixTaO4和λ> 500nm的截止濾光器時(shí)，觀察到的，它是遠(yuǎn)低于下觀察λ> 420nm的的光irradiation.The H2和O2演化率分別為1.91和0.86μmolh 1對(duì) In0.9Ni0.1TaO4，λ> 500 nm的光照射下。 “ 活性消失時(shí)的波長(zhǎng)的光照射的時(shí)間是 大于550納米。漫反射光譜（見(jiàn)圖3）觀察結(jié)果吻合得很好。相比之下，沒(méi)有 適宜在可見(jiàn)光照射下（λ> 420 nm）的光催化活性。 X-射線(xiàn)衍射分析表明，存在是沒(méi)有可觀察到的樣本之間的反應(yīng)之前和之后的結(jié)構(gòu)上的差異。剖面結(jié)構(gòu)的X射線(xiàn)衍射數(shù)據(jù)進(jìn)行細(xì)化的里特維爾德程序REITf1N12，顯示，所有樣品的結(jié)晶，在相同的黑鎢礦結(jié)構(gòu)，單斜晶系，空間群為P2 /年，晶格參數(shù)減小沿三個(gè)軸的Ni含量χ增加時(shí)，只要為χ<0.15。圖4示出的變化摻雜的內(nèi)容，其中，V和Z是細(xì)胞體積和每個(gè)細(xì)胞的數(shù)目的配方，分別與V / Z。插圖示出的c-軸參數(shù)作為Ni含量的函數(shù)，來(lái)說(shuō)明通過(guò)摻雜引起的晶格參數(shù)的變化。有一個(gè)線(xiàn)性只要增加Ni含量減少的V / Z，χ<0.15，而V / Z有一個(gè)小的膨脹時(shí)，Ni的含量χ> 0.15。在摻雜的Ni含量大于0.2，雜質(zhì)的化合物與 相，NiTa2O6，出現(xiàn)，隨著Ni含量的增加，并增加其體積分?jǐn)?shù)significandy。這是known13通過(guò)計(jì)算定義為糖耐量因子，如ABO 3的氧化物組成的八面體結(jié)構(gòu)的穩(wěn)定性，可估計(jì) 噸=（rA的+為r0）/（rB型+為r0），其中RA，RB和r0是各自的離子半徑。 0.79 |
2樓2013-01-28 18:42:26
hillatmsu
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幫你翻譯一段吧 抽空反應(yīng)系統(tǒng)后并重復(fù)進(jìn)行實(shí)驗(yàn)時(shí)，第二次和第三次反應(yīng)的氣體生成速度幾乎相同。在400小時(shí)的實(shí)驗(yàn)過(guò)程中，產(chǎn)生的氣體超過(guò)7,200 p,mol（氫氣約4,800 μmol; 氧氣約2,400μmol）。在反應(yīng)中，催化劑樣品沒(méi)有發(fā)生變化，說(shuō)明催化劑的光催化活性在可見(jiàn)光輻射下是穩(wěn)定的。反應(yīng)400小時(shí)候的轉(zhuǎn)換數(shù)，也就是生成的氣體總量和催化劑用量（在我們的系統(tǒng)中是1,412 μmol）的比例，超過(guò)了5。如以反應(yīng)了電子數(shù)與負(fù)載在樣品表面的以及進(jìn)入到InTaO4中的Ni總量之間的比例來(lái)衡量轉(zhuǎn)換數(shù)，則該值在400小時(shí)之后達(dá)到了39，這說(shuō)明這個(gè)反應(yīng)是由通過(guò)催化進(jìn)行的。 |
3樓2013-01-28 18:55:33
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4樓2013-01-29 14:26:40
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