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[求助]
求助:幫我把這段中文翻譯成英文啊,謝謝哈
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而在Ni/Ta界面插入NiO,雖然不會(huì)破壞Ni的 織構(gòu),且隨著NiO厚度的增大,薄膜中出現(xiàn)了NiO (111)衍射峰,說明NiO在強(qiáng)織構(gòu)的Ni層上生長時(shí)誘導(dǎo)了自身的 (111) 織構(gòu)。Ni(111)面的晶面間距為0.2 nm,而NiO(111)面的晶面間距為0.24 nm,兩者錯(cuò)配度達(dá)到19 %,有文獻(xiàn)表明[13],NiO薄膜生長時(shí)由于大的晶格錯(cuò)配會(huì)引起薄膜的distortion,因而,當(dāng)NiO在Ni 上生長時(shí),由于更大的晶格錯(cuò)配(達(dá)到19%), so it is reasonable to form a distorted rock salt structure以及在生長方向上大的expansion, 謝謝哈 |
木蟲 (著名寫手)
Tiny
| Insert the NiO in Ni/Ta interface, although won't destroy the texture of Ni, and along with the increase of thickness of NiO ,Film in the NiO (111) diffraction peak, explain the NiO in the Ni layer of strong texture growth induced by its own (111) texture .Ni (111) crystal plane spacing below 0.2 nm, while the NiO interplanar spacing is 0.24 nm, (111) surface mismatch degree reached 19%, both have literature suggests that [13], NiO films growth due to large lattice mismatch will cause the distortion of thin film, Consequently, when the growth of NiO on Ni, due to the larger lattice mismatch (19%),So it is reasonable to form a distorted rock salt structure and direction on the big expansion in growth. |

鐵桿木蟲 (著名寫手)
Farmer
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Ref only, you need further modify: Insertion of the NiO at the Ni/Ta interface will not destroy the texture of Ni. Appearance of the the NiO (111) diffraction peak (in XRD) upon increasing the NiO thickness is an indication that the NiO (111) texture is induced during its growth on the strong texture of the Ni layer. The interplanar spacing of the Ni (111) plane is 0.2 nm while that of the NiO is 0.24 nm, i.e., the lattice mismatch between these two crystal planes is 19%. It is known from the literature [13] that the large lattice mismatch during the NiO film growth will cause the distortion of the film (texture). Accordingly, due to even larger lattice mismatch (19%) when NiO grows on Ni, it is reasonable to observe the formation of a distorted rock salt structure and large expansion on the direction of the crystal growth. |

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