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shanshan1212金蟲 (正式寫手)
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[求助]
CPL一篇文章，幫忙查一下SCI檢索號
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題目：Surface Plasmon Interference Lithography Assisted by a Fabry–Perot Cavity Composed of Subwavelength Metal Grating and Thin Metal Film 期刊、卷期、時間：CHIN.PHYS. LETT. Vol. 32, No. 10 (2015) 104206 |
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sunshan4379
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sunshan4379
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【答案】應(yīng)助回帖
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感謝參與，應(yīng)助指數(shù) +1
shanshan1212: 金幣+5, ★★★★★最佳答案, 謝謝 2015-12-12 23:05:59
lazy錦溪: LS-EPI+1, 感謝應(yīng)助！ 2015-12-12 23:29:15
感謝參與，應(yīng)助指數(shù) +1
shanshan1212: 金幣+5, ★★★★★最佳答案, 謝謝 2015-12-12 23:05:59
lazy錦溪: LS-EPI+1, 感謝應(yīng)助！ 2015-12-12 23:29:15
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恭喜，已被收錄 Surface Plasmon Interference Lithography Assisted by a Fabry-Perot Cavity Composed of Subwavelength Metal Grating and Thin Metal Film CHINESE PHYSICS LETTERS 卷: 32 期: 10 文獻(xiàn)號: 104206 DOI: 10.1088/0256-307X/32/10/104206 出版年: OCT 2015 摘要 A surface plasmon interference lithography assisted by a Fabry-Perot (F-P) cavity composed of subwavelength metal gratings and a thin metal film is proposed to fabricate high-quality nanopatterns. The calculated results indicate that uniform straight interference fringes with high contrast and high electric-field intensity are formed in the resist under the F-P cavity. The analyses of spatial frequency spectra illuminate the physical mechanism of the formation for the interference fringes. The influence of the F-P cavity spacing is discussed in detail. Moreover, the error analyses reveal that all parameters except the metal grating period in this scheme can bear large tolerances for the device fabrication. 關(guān)鍵詞 KeyWords Plus:NANOLITHOGRAPHY; MODES; BEAMS 出版商 IOP PUBLISHING LTD, TEMPLE CIRCUS, TEMPLE WAY, BRISTOL BS1 6BE, ENGLAND 類別 / 分類 研究方向  hysicsWeb of Science 類別 hysics, Multidisciplinary文獻(xiàn)信息 文獻(xiàn)類型:Article 語種:English 入藏號: WOS:000362944000014 ISSN: 0256-307X eISSN: 1741-3540 期刊信息 Impact Factor (影響因子): Journal Citation Reports® 其他信息 IDS 號: CT6SZ Web of Science 核心合集中的 "引用的參考文獻(xiàn)": 23 Web of Science 核心合集中的 "被引頻次": 0 |
2樓2015-12-12 10:01:31
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