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We developed a postgrowth modification method of two-dimensional WO3 nanoflakes by a simultaneous solution etching and reducing process in a weakly acidic condition. The obtained dual etched and reduced WO3 nanoflakes have a much rougher surface, in which oxygen vacancies are created during the simultaneous etching/reducing process for optimized photoelectrochemical performance. The obtained photoanodes show an enhanced photocurrent density of∼1.10 mA/cm2 at 1.0 V vs Ag/AgCl (∼1.23 V vs reversible hydrogen electrode), compared to 0.62 mA/cm2 of pristine WO3 nanoflakes. The electrochemical impedance spectroscopy measurement and the density functional theory calculation demonstrate that this improved performance of dual etched and reduced WO3 nanoflakes is attributed to the increase of charge carrier density as a result of the synergetic effect of etching and reducing. |
木蟲 (知名作家)
| 我們由蝕刻和減少進程在弱的酸性條件下的聯(lián)立求解二維 WO3nanoflakes postgrowth 改性方法。獲得雙重蝕刻和減少 WO3 納米片有很多粗糙的表面,在 which oxygen 在 optimizedphotoelectrochemical 性能的同時減少刻蝕/過程中創(chuàng)建的空缺。獲得光陽極在 1.0 V vs 銀/氯化銀 (~1.23 V vs 可逆氫電極),相比于 0.62 馬/cm2 的原始 WO3 納米片顯示增強的 photocurrentdensity of~1.10 mA/cm2。電化學阻抗譜法所得的密度泛函理論計算表明,這提高協(xié)同效應的蝕刻和減少電荷載流子密度的增加雙重蝕刻和減少 WO3 納米片 isattributed 的性能。 |
禁蟲 (初入文壇)
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